Semtek Wet Etcher
1
2
機能・特性
- Revolution technology
- Effectively reduces side etching
- 3% uniformity
- 75% chemical savings
- Wafer 2
製品情報
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MANUFACTURER
Semtek -
MANUFACTURING PROCESS
Wet etcher -
DETAILS
Designed for wet etching processes to remove excess thin films on wafers. The nano-level atomizing nozzles, combined with our patented orbital-rotational technology, accelerate chemical reactions, enable precise control of chemical direction, reduce chemical usage, and enhance etching uniformity and throughput while minimizing side etching.Multiple chemical nozzles and customized chemical supply / acid-mixing systems can be configured based on customer process requirements.
営業担当者
お気軽にお問い合わせ・ご相談ください
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Yarny Lin
- Tel : 03-5530377 ext.103
- Mail : Yarny_Lin@tkk.com.tw
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Larry Chuang
- Tel : 07-3663308
- Mail : Larry_Chuang@tkk.com.tw
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Joyce Peng
- Tel : 03-5530377 ext.103
- Mail : Joyce_Peng@tkk.com.tw
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Criss Wu
- Tel : 03-5530377 ext.104
- Mail : Criss_Wu@tkk.com.tw
